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Study on Desorption Mechanism and Thermal Stability of OTS Coatings as an Anti-relaxation Material
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  • Guodong Liu,
  • Xinxin He,
  • Xiaoya Liu,
  • Donghui Ma,
  • jun tang,
  • Zongmin Ma,
  • jun liu,
  • Yanjun Li
Guodong Liu
North University of China School of Mechanical Engineering
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Xinxin He
North University of China School of Mechanical Engineering
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Xiaoya Liu
School of Semiconductors and Physics, North University of China
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Donghui Ma
School of Semiconductors and Physics, North University of China
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jun tang
North University of China
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Zongmin Ma
North University of China

Corresponding Author:mzmncit@163.com

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jun liu
North University of China
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Yanjun Li
Osaka University Department of Applied Physics
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Abstract

This research explores the desorption mechanism and thermal stability of octadecyl trichlorosilane (OTS, CH3(CH2)17SiCl3) coating on quartz slides and in alkali-metal vapor cells. We measured systematically the morphological thermal-changes, energy dissipation diversity and anti-relaxation characteristic of OTS coatings before and after exposure to Cs atoms by Fourier transform infrared spectroscopy (FTIR), water contact angle measurement, atomic force microscopy (AFM) imaging, collision energy dissipation analysis, and free induction decay (FID) of Cs atoms. The results show that the OTS coatings exhibit the best thermal stability under the specific process conditions, and the homogeneous and dense structure makes the adsorption of alkali metal atoms more stable, which effectively reduces surface energy dissipation and prolongs the relaxation time of Cs atoms. The study provides certain reference for efficient anti-relaxation coating fabrication and coated cell application.
26 Jul 2024Submitted to Micro & Nano Letters
29 Jul 2024Submission Checks Completed
29 Jul 2024Assigned to Editor
01 Aug 2024Reviewer(s) Assigned