Note: Fullerenes are identified according to the number of atoms in their structure. A letter C is used to name fullerenes, which represents the carbon atom in their structure. Fullerenes are among the materials that many nano materials are based on. Their unique structural and electronic properties, as well as their use in various fields such as electronic applications such as making nano electrodes used in special electrical circuits , nano photonics in nano solar cells and nano absorbers of specific wavelengths.

Note: Writes arbitrary and complex patterns using a focused beam of electrons. The advantage is that almost any pattern can be created. The disadvantage of commercial production is that the processing time of an individual wafer can be relatively long (tens to thousands of hours).Nanolithography, which is similar to standard semiconductor manufacturing, generally uses methods to create an image on a polymer resist layer. This image is then used as an etch mask to transfer the nanoscale pattern to the desired material. Nanolithography methods include interference lithography, electron beam lithography (electron beam) and repeating the nano pattern (for definitions to the sidebar). In general, each of these methods is optimal for some nanostructure patterns, materials and required volume. As a manufacturing method, nanolithography supports a wide range of integration modes for optical circuits.

Note:  to easily create interference patterns of useful dimensions using UV light sources. The advantage of this method is simplicity. The problem is in creating complex shapes and arrays.Nanolithography is a branch of nanotechnology that deals with the study and application of fabricating structures at the nanometer scale—meaning the creation of patterns with at least one lateral dimension between the size of an individual atom and approximately 100 nanometers. It is used in the fabrication of advanced semiconductor integrated circuits (nanocircuits) or nanoelectromechanical systems (NEMS).Nanolithography is a broad term. To describe different processes for creating nanoscale patterns in different environments, the most common of which is silicon semiconductor material. The dominant goal of nanolithography is the miniaturization of electronic devices, which allows more electronic components to be packed into smaller spaces, i.e. smaller integrated circuits, which leads to smaller devices, because they are produced faster and cheaper. Because less material is needed. This also increases performance and response time because electrons only have to travel very short distances.

Note: The tip of a Scanning Tunneling Microscope (STM) or Atomic Force Microscope (AFM) offers not only the ability to image down to atomic resolution, but also the capabilities of nanostructures with such excellent resolution. A paradigmatic example is the fabrication of a furnace furnace by manipulating individual atoms on a surface using STM. Although the speed of making such a thing has recently improved, it is a process with great difficulties in scaling and integrating with the semiconductor industry.The use of AFM for scanning probe lithography also suffers from power-related problems, but it is better suited than STM for this task due to the less stringent requirements of the technique: no very high vacuum conditions. , conductive surface or very good tip-to-sample distance control is required. Scanning probe nanolithography based on AFM can be performed through different mechanisms and offers a wide range of possibilities . Therefore, the AFM tip can produce localized changes in the composition, height, or physical/chemical properties of surfaces through thermal effects, mechanical effects, deposition, chemical effects, etc. The principle of this technique for making electronic nano devices has been drawn and the example of making Si nanowires based on the oxidation of nanolithography probe Scanning is done. A derived technique that has become very popular is dip-pen nanolithography, in which the tip deposits specific inks with excellent clarity at desired locations.

Note: In this technique, a thin plate with designed apertures, called a stencil mask, is placed adjacent to the substrate and used in combination with material evaporation. be. Evaporated material stops at the upper surface of the stencil mask, except in the openings. So the material grows with specific patterns determined by the stencil mask.Using appropriate stencil masks, nanopatterned materials can be grown at wafer scale in one shot. Resolution down to 20 nm has been achieved and can be used on non-conventional substrates such as rope , but this technique suffers from some problems related to deposition. Shade under the stencil mask tolerates lifetime issues due to stencil mask deterioration caused by material depositing at the edge of the holes, eventually blocking them (occlusion effect). Advances such as the use of dynamic stencil masks have increased the range of applications of this technique.

Note: Scanning Nano Lithography or Scanning Nano Lithography  enables the original or improved nano pattern in applied fields ranging from quantum technologies to material science.In particular, ultra-fast and highly localized thermal processing of surfaces can be achieved through a sharp heating tip to create high-resolution patterns. Many possible applications of nanoscale modifications with thermal probes such as Scanning Nano Lithography are still applicable in nanoelectronics, especially when which can use extremely high heating and cooling rates.Many microsystems and nanosystems require precise nanoscale patterns that exhibit intrinsic functionality, such as some electronic properties. , photonic, chemical and mechanical. To make these nanoscale patterns, electron beam lithography is the most common lithography technique without direct writing and without mask.Scanning Nano Lithography A complex electron compatible optic is required to focus the electron beam into a spot of a few nanometers. Another issue is electron scattering, a kind of proximity effect, on the surface of the sample, which leads to the exposure of additional undesirable resistivity that must be corrected by intensive calculation algorithms. Scanning Nano Lithography is another method of direct writing nanolithography, where patterns are created by scanning a nanometer tip on the sample to create local changes.  Sample-sample interactions are numerous and can include mechanical, electrical, diffusion, and thermal effects.

Note: The ability to produce large micro- and nanostructures on non-planar surfaces is important for many applications such as optics, optoelectronics, nanophotonics, imaging technology, NEMS, and microfluidics.However, it is very difficult to create large nanostructures on curved or non-planar surfaces using existing patterning methods. Furthermore, a variety of current nanopatterning technologies, such as electron beam lithography, optical lithography, interference lithography (IL), etc., cannot meet all the practical demands of industrial applications in terms of high resolution. High power, low cost cope. , large area and patterns on non-flat and curved surface. Therefore, new high-volume nano-manufacturing technology urgently needs to be exploited and developed to meet the extraordinary needs of growing markets.Lithography Nanoelectronics is currently considered as a promising low-cost, high-throughput, and high-resolution nanopatterning method, especially for the production of large-scale small/nanopatterns and complex 3D structures, as well as the aspect The above characteristics of the ratio  have also given rise to these prominent advantages. This field becomes Especially, nanoelectronic lithography has great potential to set new standards for making miniature, low-cost and light-weight optics that can be used in many fields of applications.

Note: Graphene nanomemories  have been developed molecularly, providing excellent programmable nanoscale memory performance compared to previous graphene memory devices and a memory window. Large (12V), fast switching speed (1 microsecond), shows strong electrical reliability.Graphene molecular nanomemories shows unique electronic properties and its small dimensions, structural strength and high performance make it a charge storage medium for applications Nano memory is very promising. We use a set of techniques using a solution of nanoparticles, which creates a very thin layer on the target substrate and is used as a sacrificial layer during the nanopatterning process. will be

Note: Some materials can give rise to regular, nanoscale structures under appropriate and controlled conditions - self-assembly. The problem of this approach is the lack of flexibility in the structures that can be achieved and the materials that can be used, which limits the functions that can be realized.

Note:  The modeling of Si/Cu nanoparticles is based on a relationship between molecular mechanics and solid mechanics, an energy-equivalent model is used for the mechanical properties and nanomolecular structure of the sputtering layer of the material.In nanoelectronics technology, special parameters and systems must be used to perform such processes. For example, in the metal marking process,  it is inevitable to use copper metal instead of the common aluminum metal for internal connections between different practical parts. But the rapid penetration of  Cu atoms under Si during heat treatment leads to the formation of a copper silicide layer and ultimately causes the destruction of the electronic component. To solve this  problem, they usually use an intermediate layer of retarding materials such as Ta and w or Mo as a penetration barrier to improve the thermal stability of the Si/Cu layer  .

Note: Nano-photonics or nano-optics includes metal components that can transmit and focus light, often refers to ultraviolet, visible and infrared rays, whose wavelength ranges from 300 to 1200 nm. Nano lasers  are one of the components of Nano Photonics.Nanophotonics or nanooptics is the study of the behavior of light based on the interactions of optical material science and engineering, at wavelength and wavelength scales, where natural or chemical projects of nanostructured natural materials or nanotechnology at scale Nanophotonics and synthetics using optics including silicon-based semiconductors (where nanophotonics improve speed and performance) are associated with specific technologies such as optical engineering, electrical engineering, and nanotechnology.

Note: In nanoelectronics technology, special parameters and systems must be used to perform such processes. For example, in the metal marking process,  it is inevitable to use copper metal instead of the common aluminum metal for internal connections between different practical parts. But the rapid penetration of  Cu atoms under Si during heat treatment leads to the formation of a copper silicide layer and ultimately causes the destruction of the electronic component. To solve this  problem, they usually use an intermediate layer of retarding materials such as Ta and w or Mo as a penetration barrier to improve the thermal stability of the Si/Cu layer  . In the characterization of nanoparticles and Si/Ta/Cu multi-layer systems, there is an effect of negative bias voltage on improving the electrical and structural properties of the permeation barrier of the Ta sputtering layer in the Si/Ta system.  Surface processes of the Si layer, including burning, are carried out by plasma and ion beam technology. This kind of  integrated circuits with their unique characteristics in the nanometer scale have various applications of mesoscopic systems.