Zhiting Peng, Department of Ophthalmology, The University of Hong Kong, Pokfulam Road, Hong Kong, ChinaYage Zhang, Department of Mechanical Engineering, The University of Hong Kong, Pokfulam Road, Hong Kong, ChinaResearch Centre for Biomimetic Tactile and Intelligent Sensing, Institute of Biomedical and Health Engineering, ChinaPengcheng Zhang, Research Centre for Biomimetic Tactile and Intelligent Sensing, Institute of Biomedical and Health Engineering, Shenzhen Institute of Advanced Technology, Chinese Academy of Sciences, ChinaTianzhun Wu, Research Centre for Biomimetic Tactile and Intelligent Sensing, Institute of Biomedical and Health Engineering, Shenzhen Institute of Advanced Technology, Chinese Academy of Sciences, China Email: tz.wu@siat.ac.cnYau Kei Chan, Department of Ophthalmology, The University of Hong Kong, Pokfulam Road, Hong Kong, China, Telephone: (852) 39177904, Email: jchanyk@hku.hkAbstract:Nanoimprint lithography (NIL) is a cost-effective and high-throughput technology for replicating nanoscale structures that do not require expensive light sources for advanced photolithography equipment. NIL overcomes the limitations of light diffraction or beam scattering in traditional photolithography, suited to replicating nanoscale structures with high resolution. Roller nanoimprint lithography (R-NIL) is the most popular NIL technique by benefiting large-scale, continuous, and efficient industrial production. In the past two decades, a range of R-NIL equipment has emerged to meet the industrial needs for biomedical devices, semiconductors, flexible electronics, optical film, and interface functional material. R-NIL equipment achieves a simpler, more compact design, allowing multiple units to be clustered together for increased productivity. These units include transmission control, resist coating, resist curing, and imprinting. This critical review summarizes the hitherto R-NIL processes, their typical technical problems, and corresponding solutions and gives guidelines for developing advanced R-NIL equipment.Keywords: Roller nanoimprint lithography; Micro-nano machining; Micro-nano structure; Semiconductor; Microfluidics