David Moss

and 7 more

Layered two-dimensional (2D) GO films are integrated with silicon-on-insulator (SOI) nanowire waveguides to experimentally demonstrate an enhanced Kerr nonlinearity, observed through self-phase modulation (SPM). The GO films are integrated with SOI nanowires using a large-area, transfer-free, layer-by-layer coating method that yields precise control of the film thickness. The film placement and coating length are controlled by opening windows in the silica cladding of the SOI nanowires. Owing to the strong mode overlap between the SOI nanowires and the highly nonlinear GO films, the Kerr nonlinearity of the hybrid waveguides is significantly enhanced. Detailed SPM measurements using picosecond optical pulses show significant spectral broadening enhancement for SOI nanowires coated with 2.2-mm-long films of 1−3 layers of GO, and 0.4-mm-long films with 5−20 layers of GO. By fitting the experimental results with theory, the dependence of GO’s n2 on layer number and pulse energy is obtained, showing interesting physical insights and trends of the layered GO films from 2D monolayers to quasi bulk-like behavior. Finally, we show that by coating SOI nanowires with GO films the effective nonlinear parameter of SOI nanowires is increased 16 fold, with the effective nonlinear figure of merit (FOM) increasing by about 20 times to FOM > 5. These results reveal the strong potential of using layered GO films to improve the Kerr nonlinear optical performance of silicon photonic devices.

David Moss

and 5 more

Polarization selective devices, such as polarizers and polarization selective resonant cavities (e.g., gratings and ring resonators), are core components for polarization control in optical systems and find wide applications in polarization-division-multiplexing, coherent optical detection, photography, liquid crystal display, and optical sensing. In this paper, we demonstrate integrated waveguide polarizers and polarization-selective micro-ring resonators (MRRs) incorporated with graphene oxide (GO). We achieve highly precise control of the placement, thickness, and length of the GO films coated on integrated photonic devices by using a solution-based, transfer-free, and layer-by-layer GO coating method followed by photolithography and lift-off processes. The latter overcomes the layer transfer fabrication limitations of 2D materials and represent a significant advance towards manufacturing integrated photonic devices incorporated with 2D materials. We measure the performance of the waveguide polarizer for different GO film thicknesses and lengths versus polarization, wavelength, and power, achieving a very high polarization dependent loss (PDL) of ~ 53.8 dB. For GO-coated integrated MRRs, we achieve an 8.3-dB polarization extinction ratio between the TE and TM resonances, with the extracted propagation loss showing good agreement with the waveguide results. Furthermore, we present layer-by-layer characterization of the linear optical properties of 2D layered GO films, including detailed measurements that conclusively determine the material loss anisotropy of the GO films as well as the relative contribution of film loss anisotropy versus polarization-dependent mode overlap, to the device performance. These results offer interesting physical insights and trends of the layered GO films from monolayer to quasi bulk like behavior and confirm the high-performance of integrated polarization selective devices incorporated with GO films.